Molecular Imprints, Inc. (MII) announced that Motorola Labs will take delivery on the first Step and Flash Imprint Lithography (S-FILTM) system, the Imprio 100 in late May. They will use the
tool to perform advanced device research in the areas of novel devices,
compound semiconductors, molecular electronics, and photonic and optical
devices.
The Imprio 100 is the initial product offering from MII. The tool employs
Step and Flash Imprint Lithography (S-FIL) and is capable of creating sub-100
nanometer images. S-FIL is a bi-layer approach using a low-viscosity,
UV-curable liquid etch barrier deposited on an underlying transfer layer. The
template is rigid and transparent allowing for UV curing of the etch barrier
and the adaptation of traditional layer-to-layer alignment techniques. This
lithography approach may be the enabling technology for research applications
in the areas of nano-devices, MEMS and optical communications components and
devices.